TELKOMNIKA Telecommunication, Computing, Electronics and Control
Characterization and structural analysis of RF magnetron sputtered strontium stannate thin films

TELKOMNIKA Telecommunication, Computing, Electronics and Control
Characterization and structural analysis of RF magnetron sputtered strontium stannate thin films

Perovskite
RF magnetron sputtering
SrSnO3
Strontium Stannate
Thin Film

This paper presents physical and morphology properties of strontium stannate
(SrSnO3) perovskite-type as a candidate of an n-type material thin film for
organic-inorganic hybrid diode heterojunction for optoelectronics application.
Typical wet-process of SrSnO3 deposition produce thick film and having 10-8
S/cm order in conductivity. The SrSnO3 thin films were deposited on ITO glass
substrates by RF magnetron sputtering using a purity 99.9% SrSnO3 target
with 5.0 mTorr of gas pressure and 100 W of RF power at room temperature.
The gas composition of pure argon (75%) and reactive oxygen gas (25%) was
used for 60 min. XRD diffraction patterns revealed that the thin films are
orthorhombic crystal structure with lattice parameter a=5.7040 Ǻ, b=8.06 Ǻ
and c=5.7080 Ǻ with a strong orientation in the (002) direction. SEM images
showed that films exhibited uniform surface morphology with a roughness
average of Ra=2.258 nm and thickness of 311 nm. The EDX spectrum
confirmed the presence of O, Sr, and Sn elements in the films with 75.22%,
8.29%, 16.49% in atomic number, respectively. The films were having a
conductivity of 8.33102 S/cm with low resistivity of 12.410-3 -cm.

Yusmar Palapa Wijaya, Khairul Anuar Mohamad, Abu Bakar Abdul Rahman, Afishah Alias, Mohammad Syahmi Nordin

http://journal.uad.ac.id/index.php/TELKOMNIKA

Jan 20, 2021

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