Safety and Health at Work Vol. 10 Issue 1 2019
Evaluation of Hazardous Chemicals with Material Safety Data Sheet and By-products of a Photoresist Used in the Semiconductor-Manufacturing Industry (Original Article)
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Title
Safety and Health at Work Vol. 10 Issue 1 2019
Evaluation of Hazardous Chemicals with Material Safety Data Sheet and By-products of a Photoresist Used in the Semiconductor-Manufacturing Industry (Original Article)
Evaluation of Hazardous Chemicals with Material Safety Data Sheet and By-products of a Photoresist Used in the Semiconductor-Manufacturing Industry (Original Article)
Subject
By-product, Material safety data sheet, Photoresist, Semiconductor, Trade secret
Description
Background: The photolithography process in the semiconductor industry uses various chemicals with
little information on their constitution. This study aimed to identify the chemical constituents of
photoresist (PR) products and their by-products and to compare these constituents with material safety
data sheets (MSDSs) and analytical results.
Methods: A total of 51 PRs with 48 MSDSs were collected. Analysis consisted of two parts: First, the
constituents of the chemical products were identified and analyzed using MSDS data; second, for verification of the by-products of PR, volatile organic compounds were analyzed. The chemical constituents were categorized according to hazards.
Results: Forty-five of 48 products contained trade secrets in amounts ranging from 1 to 65%. A total of
238 ingredients with multiple counting (35 ingredients without multiple counting) were identified in the MSDS data, and 48.7% of ingredients were labeled as trade secrets under the Korea Occupational Safety and Health Act. The concordance rate between the MSDS data and the analytical result was 41.7%. The by-product analysis identified 129 chemicals classified according to Chemical Abstracts Service No., with 17 chemicals that are carcinogenic, mutagenic, and reprotoxic substances. Formaldehyde was found to be released from 12 of 21 products that use novolak resin.
Conclusion: We confirmed that several PRs contain carcinogens, and some were not specified in the
toxicological information in the MSDS. Hazardous chemicals, including benzene and formaldehyde, are
released from PRs products as by-products. Therefore, it is necessary to establish a systematic management system for chemical compounds and the working environment.
little information on their constitution. This study aimed to identify the chemical constituents of
photoresist (PR) products and their by-products and to compare these constituents with material safety
data sheets (MSDSs) and analytical results.
Methods: A total of 51 PRs with 48 MSDSs were collected. Analysis consisted of two parts: First, the
constituents of the chemical products were identified and analyzed using MSDS data; second, for verification of the by-products of PR, volatile organic compounds were analyzed. The chemical constituents were categorized according to hazards.
Results: Forty-five of 48 products contained trade secrets in amounts ranging from 1 to 65%. A total of
238 ingredients with multiple counting (35 ingredients without multiple counting) were identified in the MSDS data, and 48.7% of ingredients were labeled as trade secrets under the Korea Occupational Safety and Health Act. The concordance rate between the MSDS data and the analytical result was 41.7%. The by-product analysis identified 129 chemicals classified according to Chemical Abstracts Service No., with 17 chemicals that are carcinogenic, mutagenic, and reprotoxic substances. Formaldehyde was found to be released from 12 of 21 products that use novolak resin.
Conclusion: We confirmed that several PRs contain carcinogens, and some were not specified in the
toxicological information in the MSDS. Hazardous chemicals, including benzene and formaldehyde, are
released from PRs products as by-products. Therefore, it is necessary to establish a systematic management system for chemical compounds and the working environment.
Creator
Miyeon Jang, Chungsik Yoon, Jihoon Park, Ohhun Kwon
Publisher
Elsevier Korea LLC
Date
March 2019
Contributor
Sri Wahyuni
Format
PDF
Language
English
Type
Text
Coverage
Safety and Health at Work Vol. 10 Issue 1 2019
Files
Citation
Miyeon Jang, Chungsik Yoon, Jihoon Park, Ohhun Kwon, “Safety and Health at Work Vol. 10 Issue 1 2019
Evaluation of Hazardous Chemicals with Material Safety Data Sheet and By-products of a Photoresist Used in the Semiconductor-Manufacturing Industry (Original Article),” Repository Horizon University Indonesia, accessed February 5, 2025, https://repository.horizon.ac.id/items/show/1877.
Evaluation of Hazardous Chemicals with Material Safety Data Sheet and By-products of a Photoresist Used in the Semiconductor-Manufacturing Industry (Original Article),” Repository Horizon University Indonesia, accessed February 5, 2025, https://repository.horizon.ac.id/items/show/1877.