TELKOMNIKA Telecommunication, Computing, Electronics and Control
Modeling and characterization of optimal nano-scale channel dimensions for fin field effect transistor based on constituent semiconductor materials

Dublin Core

Title

TELKOMNIKA Telecommunication, Computing, Electronics and Control
Modeling and characterization of optimal nano-scale channel dimensions for fin field effect transistor based on constituent semiconductor materials

Subject

Channel dimensions, FinFET, ION/IOFF ratio, MuGFET simulator, Subthreshold swing

Description

This study aims to design an optimal nano-dimensional channel of fin field effect transistor (FinFET) on the basis of electrical characteristics and constituent semiconductor materials (Si, GaAs, Ge, and InAs) to overcome issues regarding the shrinking of dimensions and ensure the best performance of FinFETs. This objective has been achieved by proposing a new scaling factor, K, to simultaneously shrink the physical scaling limits of channel dimensions for various FinFETs without degrading their performance. A simulation-based comprehensive comparative study depending on four variable parameters (length, width, oxide thickness of the channel, and scaling factor) was carried out. The influence of changing channel dimensions on the performance of each type of FinFET was evaluated according to four electrical characteristics: i) ON-state/OFF-state current (ION/IOFF) ratio, ii) subthreshold swing (SS), iii) threshold voltage, and iv) drain-induced barrier lowering. The well-known multi-gate field-effect transistor (MuGFET) simulation tool for nanoscale MuGFET structure was utilized to conduct experimental simulations under the considered conditions. The obtained simulation results showed that the optimal channel dimensions for the best performance of all considered FinFET types were achieved at a minimal scaling factor K=0.125 with 5 nm length, 2.5 nm width, and 0.625 nm oxide thickness of the channel.

Creator

Waheb A. Jabbar, Ahmed Mahmood, Jamil Sultan

Source

DOI: 10.12928/TELKOMNIKA.v20i1.21671

Publisher

Universitas Ahmad Dahlan

Date

February 2022

Contributor

Sri Wahyuni

Rights

ISSN: 1693-6930

Relation

http://journal.uad.ac.id/index.php/TELKOMNIKA

Format

PDF

Language

English

Type

Text

Coverage

TELKOMNIKA Telecommunication, Computing, Electronics and Control

Files

Collection

Tags

,Repository, Repository Horizon University Indonesia, Repository Universitas Horizon Indonesia, Horizon.ac.id, Horizon University Indonesia, Universitas Horizon Indonesia, HorizonU, Repo Horizon , ,Repository, Repository Horizon University Indonesia, Repository Universitas Horizon Indonesia, Horizon.ac.id, Horizon University Indonesia, Universitas Horizon Indonesia, HorizonU, Repo Horizon , ,Repository, Repository Horizon University Indonesia, Repository Universitas Horizon Indonesia, Horizon.ac.id, Horizon University Indonesia, Universitas Horizon Indonesia, HorizonU, Repo Horizon , ,Repository, Repository Horizon University Indonesia, Repository Universitas Horizon Indonesia, Horizon.ac.id, Horizon University Indonesia, Universitas Horizon Indonesia, HorizonU, Repo Horizon , ,Repository, Repository Horizon University Indonesia, Repository Universitas Horizon Indonesia, Horizon.ac.id, Horizon University Indonesia, Universitas Horizon Indonesia, HorizonU, Repo Horizon ,

Citation

Waheb A. Jabbar, Ahmed Mahmood, Jamil Sultan, “TELKOMNIKA Telecommunication, Computing, Electronics and Control
Modeling and characterization of optimal nano-scale channel dimensions for fin field effect transistor based on constituent semiconductor materials,” Repository Horizon University Indonesia, accessed February 4, 2025, https://repository.horizon.ac.id/items/show/4272.